Specific Process Knowledge/Etch/Wet III-V Etches: Difference between revisions

Revision as of 13:45, 14 May 2014 view source Kabi (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 1,146 edits →H3PO4:H2O2:H2O etch ← Older edit		Revision as of 13:45, 14 May 2014 view source Kabi (talk \| contribs) DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers 1,146 edits →BHF etch Newer edit →
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	'''(1)''' Process '''SiO2thi1''' in PECVD2. '''(2)''' Ti from Titest.prg on Physimeca. It seems there is no measurable etchig during first 10 seconds.		'''(1)''' Process '''SiO2thi1''' in PECVD2. '''(2)''' Ti from Titest.prg on Physimeca. It seems there is no measurable etchig during first 10 seconds.

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