Specific Process Knowledge/Lithography/Strip: Difference between revisions
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*After the rough strip place your wafers directly in the final bath, switch on for the ultra sound and strip them for 2-3 min. | *After the rough strip place your wafers directly in the final bath, switch on for the ultra sound and strip them for 2-3 min. | ||
*Rinse your wafers for 4-5 min. in running water after stripping . | *Rinse your wafers for 4-5 min. in running water after stripping . | ||
'''The user APV, and contact information can be found in LabManager: [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=70 Rough Strip] [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=72 Fine Strip]''' | |||
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