Specific Process Knowledge/Lithography/Coaters: Difference between revisions
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==Manual Spinner 1 | ==Manual Spinner 1== | ||
[[Image:IMG 1175.JPG|300x300px|thumb|right|The Manual Spinner 1: positioned in fumehood in E-5]] | [[Image:IMG 1175.JPG|300x300px|thumb|right|The Manual Spinner 1: positioned in fumehood in E-5]] | ||
'''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters# | '''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Manual_Spinner_1 click here]''' | ||
Manual Spinner 1, WS-650 model, from Laurell is a resist spinning coater at Danchip which can be used for spinning on whole 2", 4" and 6" substrates and also a small pieces. | Manual Spinner 1, WS-650 model, from Laurell is a resist spinning coater at Danchip which can be used for spinning on whole 2", 4" and 6" substrates and also a small pieces. | ||