Specific Process Knowledge/Lithography/Strip: Difference between revisions

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 | style="background:LightGrey; color:black"|Allowed materials
 |style="background:WhiteSmoke; color:black"|
-*Si and silicon oxide, silicon nitride
+Silicon, glass, and polymer substrates
-*Quartz, pyrex
-*Metal patterning
+Film or pattern of all but Type IV
 |style="background:WhiteSmoke; color:black"|
-*No metal!
+No metal!
-*Si and silicon oxide, silicon nitride
-*Quartz, pyrex
+Silicon, glass, and polymer substrates
+Film or pattern of photoresist/polymer
 |style="background:WhiteSmoke; color:black"|
-*III-V compounds
+Silicon, III-V, and glass substrates
+Film or pattern of all but Type IV
 |style="background:WhiteSmoke; color:black"|
-*Si and silicon oxide, silicon nitride
+No metal!
-*Quartz, pyrex
+Silicon, glass, and polymer substrates
+Film or pattern of photoresist/polymer
 |style="background:WhiteSmoke; color:black"|
-*Si and silicon oxide, silicon nitride
+Silicon and glass substrates
-*Quartz, pyrex
-*All metals
+Film or pattern of all but Type IV
 |-
 |}