Specific Process Knowledge/Lithography/Strip: Difference between revisions
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[[Image:Lift-off wet bench.JPG|300x300px|thumb|Acetone strip bench in D-3]] | [[Image:Lift-off wet bench.JPG|300x300px|thumb|Acetone strip bench in D-3]] | ||
{| border="1" cellspacing="0" cellpadding="4" align=" | {| border="1" cellspacing="0" cellpadding="4" align="left" | ||
|[[Image:Acetone_rough.jpg|150x150px|thumb|Acetone bath "rough" for removing most of the resist]] | |[[Image:Acetone_rough.jpg|150x150px|thumb|Acetone bath "rough" for removing most of the resist]] | ||
|[[Image:Acetone_fine.jpg|150x150px|thumb|Acetone bath "fine" for removing the rest of the resist incl. ultrasound]] | |[[Image:Acetone_fine.jpg|150x150px|thumb|Acetone bath "fine" for removing the rest of the resist incl. ultrasound]] | ||