Specific Process Knowledge/Lithography/EBeamLithography: Difference between revisions
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== Proximity Error Correction (PEC) in BEAMER == | == Proximity Error Correction (PEC) in BEAMER == | ||
[[Image:beamer5.jpg|frame| | [[Image:beamer5.jpg|frame|250x250px|right]] | ||
BEAMER is endowed with a software that corrects for proximity errors in the e-beam exposure. You can ready more about this function in the BEAMER manual in LabManager under Technical Documents [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=292 here] and in the BEAMER presentation here [[media:BEAMERPresentation.pdf|BEAMERPresentation.pdf]]. | BEAMER is endowed with a software that corrects for proximity errors in the e-beam exposure. You can ready more about this function in the BEAMER manual in LabManager under Technical Documents [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=292 here] and in the BEAMER presentation here [[media:BEAMERPresentation.pdf|BEAMERPresentation.pdf]]. | ||