Specific Process Knowledge/Lithography/ZEP520A: Difference between revisions
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[[File: | [[File:SpinCurveZEP520A1_1.jpg|right|500px]] | ||
This spin curve data performed with ZEP520A1:1 bottle opened 13-01-2014 (i.e. approximately 3 month old). | |||
The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers. | The thickness is measured on VASE Ellipsometer using a simple Cauchy model for a transparent polymer on Si. The measurements are performed at one incidence angle (70 degrees) only. 9 points on each 4" wafer has been measured; the standard deviation thus representing the homogeinity of the film on the 4" wafers. | ||
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|-style="background:Black; color:White" | |-style="background:Black; color:White" | ||
!colspan="7"|AllResist AR-P 6200/2 spinning on Spin Coater: Manual LabSpin A-5, TIGRE, | !colspan="7"|AllResist AR-P 6200/2 spinning on Spin Coater: Manual LabSpin A-5, TIGRE, 23-04-2014 | ||
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!Thickness [nm] | !Thickness [nm] | ||
!St Dev | !St Dev | ||
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|3000 | |3000 | ||
|4000 | |4000 | ||
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|4000 | |4000 | ||
|4000 | |4000 | ||
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|5000 | |5000 | ||
|4000 | |4000 | ||
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