Specific Process Knowledge/Lithography/CSAR: Difference between revisions
No edit summary |
No edit summary |
||
| Line 25: | Line 25: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Spin Coater Manual, LabSpin, A-5 | |Spin Coater Manual, LabSpin, A-5 | ||
|60 sec at various spin speed. Acceleration 4000 s-2, softbake 5 min at 150 deg Celcius | |60 sec at various spin speed. | ||
Acceleration 4000 s-2, | |||
softbake 5 min at 150 deg Celcius | |||
|Resist poured directly from bottle | |Resist poured directly from bottle | ||
|TIGRE, 09-04-2014 | |TIGRE, 09-04-2014 | ||
| Line 52: | Line 54: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|JEOL 9500 E-beam writer, E-1 | |JEOL 9500 E-beam writer, E-1 | ||
|Dosepattern 14nm - 100nm, dose 120-280 muC/cm2 | |Dosepattern 14nm - 100nm, | ||
dose 120-280 muC/cm2 | |||
|Virtual chip mark height detection | |Virtual chip mark height detection | ||
| TIGRE, 10-04-2014 | | TIGRE, 10-04-2014 | ||
| Line 65: | Line 68: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
|Fumehood, D-3 | |Fumehood, D-3 | ||
|60 sec in X AR 600-54/6, 60 sec rinse in IPA, N2 Blow dry | |60 sec in X AR 600-54/6, | ||
60 sec rinse in IPA, | |||
N2 Blow dry | |||
|Agitation (by hand) while developing | |Agitation (by hand) while developing | ||
| TIGRE, 10-04-2014 | | TIGRE, 10-04-2014 | ||