Specific Process Knowledge/Lithography/CSAR: Difference between revisions
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!colspan="3"|Spin Coat of AllResist AR-P 6200-2, TIGRE, 09-04-2014 | |||
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|Dosepattern 14nm - 100nm, dose 120-280 muC/cm2 | |Dosepattern 14nm - 100nm, dose 120-280 muC/cm2 | ||
|Virtual chip mark height detection | |Virtual chip mark height detection | ||
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!colspan="3"|Development, TIGRE, 10-04-2014 | |||
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|Fumehood, D-3 | |||
|60 sec in X AR 600-54/6, 60 sec rinse in IPA, N2 Blow dry | |||
|Agitation (by hand) while developing | |||
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!colspan="3"|Characterization, TIGRE, ??-04-2014 | |||
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|Zeiss SEM Supra 60VP, D-3 | |||
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