Specific Process Knowledge/Lithography/CSAR: Difference between revisions

Revision as of 14:47, 10 April 2014

Test of Chemically Semi-Amplified Resist (CSAR); a positive e-beam resist from AllResist (AR-P 6200-2).

Equipment	Process Parameters	Comments
Spin Coat of AllResist AR-P 6200-2, TIGRE, 09-04-2014
Spin Coater Manual, LabSpin, A-5	60 sec at various spin speed. Acceleration 4000 s-2, softbake 5 min at 150 deg Celcius	Resist poured directly from bottle
E-beam Exposure, TIGRE, 10-04-2014
JEOL 9500 E-beam writer, E-1	Dosepattern 14nm - 100nm, dose 120-280 muC/cm2	Virtual chip mark height detection
Development, TIGRE, 10-04-2014
Fumehood, D-3	60 sec in X AR 600-54/6, 60 sec rinse in IPA, N2 Blow dry	Agitation (by hand) while developing
Characterization, TIGRE, ??-04-2014
Zeiss SEM Supra 60VP, D-3

AllResist SX 6200/2 spinning on Manual Spinner LabSpin A-5, TIGRE, 09-04-2014
Spin Speed [rpm]	Acceleration [1/s2]	Thickness [nm]	St Dev
2000	4000
3000	4000
4000	4000
5000	4000
6000	4000
7000	4000

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-!colspan="3"|Spin Coat of AllResist AR-P 6200-2, TIGRE, 09-04-2014
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+|-style="background:LightGrey; color:black"
+!colspan="3"|Spin Coat of AllResist AR-P 6200-2, TIGRE, 09-04-2014
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 |Dosepattern 14nm - 100nm, dose 120-280 muC/cm2
 |Virtual chip mark height detection
+|-
+|-
+|-style="background:LightGrey; color:black"
+!colspan="3"|Development, TIGRE, 10-04-2014
+|-
+|-
+|-style="background:WhiteSmoke; color:black"
+|Fumehood, D-3
+|60 sec in X AR 600-54/6, 60 sec rinse in IPA, N2 Blow dry
+|Agitation (by hand) while developing
+|-
+|-
+|-style="background:LightGrey; color:black"
+!colspan="3"|Characterization, TIGRE, ??-04-2014
+|-
+|-
+|-style="background:WhiteSmoke; color:black"
+|Zeiss SEM Supra 60VP, D-3
+|
+|
 |-