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Specific Process Knowledge/Lithography/CSAR: Difference between revisions

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CSAR
Test of Chemically Semi-Amplified Resist (CSAR); a positive e-beam resist from AllResist (AR-P 6200-2).


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|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
!colspan="3"|Spin Coat of AllResist SX 6200/2, TIGRE, 09-04-2014
!colspan="3"|Spin Coat of AllResist AR-P 6200-2, TIGRE, 09-04-2014
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|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!Spin Coater
!Equipment
!Process Parameters
!Process Parameters
!Comments
!Comments
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|60 sec at various spin speed. Acceleration 4000 s-2, softbake 5 min at 150 deg Celcius
|60 sec at various spin speed. Acceleration 4000 s-2, softbake 5 min at 150 deg Celcius
|Resist poured directly from bottle
|Resist poured directly from bottle
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|-style="background:LightGrey; color:black"
!colspan="3"|E-beam Exposure, TIGRE, 10-04-2014
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|-style="background:WhiteSmoke; color:black"
|JEOL 9500 E-beam writer, E-1
|Dosepattern 14nm - 100nm, dose 120-280 muC/cm2
|Virtual chip mark height detection
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!Spin Speed [rpm]
!Spin Speed [rpm]
!Acceleration [1/s2]
!Acceleration [1/s2]
!Spin Time [s]
!Thickness [nm]
!Thickness [nm]
!St Dev
!St Dev
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|2000
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|4000
|60
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|3000
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|4000
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|60
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|4000
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|5000
|5000
|4000
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|60
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|6000
|6000
|4000
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|60
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|7000
|7000
|4000
|4000
|60
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