Specific Process Knowledge/Thin film deposition/Furnace LPCVD PolySilicon: Difference between revisions
No edit summary |
|||
| Line 82: | Line 82: | ||
|style="background:LightGrey; color:black"|Process pressure | |style="background:LightGrey; color:black"|Process pressure | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*250 mTorr | *200-250 mTorr | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*150-220 mTorr | *150-220 mTorr | ||