Specific Process Knowledge/Characterization/Sample imaging: Difference between revisions
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The list of instruments for sample imaging available at Danchip includes 6 [[Specific Process Knowledge/Characterization/Optical microscope|optical microscopes]] , three [[Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy|scanning electron microscopes]] (SEM's) and an [[Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy|atomic force microscope]] (AFM). These instruments cover a wide range of applications | The list of instruments for sample imaging available at Danchip includes 6 [[Specific Process Knowledge/Characterization/Optical microscope|optical microscopes]] , three [[Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy|scanning electron microscopes]] (SEM's) and an [[Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy|atomic force microscope]] (AFM). These instruments cover a wide range of applications. | ||
=== What kind of instrument to use === | |||
There is a lot of optical microscope scattered around in the cleanroom because they are in great need. They are useful if, for instance, you need to | |||
* inspect the quality of UV exposed photoresist when doing photolithography, | |||
* check for particles on wafers that have been processed in the furnaces or the PECVD's, | |||
* check the quality of KOH etched structures or | |||
* generally verify any in batch process | |||
Using the different options such as bright/dark field, polarizer or transmitted/reflected light one can find a better signal for a specific need. | |||
Revision as of 11:20, 24 January 2008
The list of instruments for sample imaging available at Danchip includes 6 optical microscopes , three scanning electron microscopes (SEM's) and an atomic force microscope (AFM). These instruments cover a wide range of applications.
What kind of instrument to use
There is a lot of optical microscope scattered around in the cleanroom because they are in great need. They are useful if, for instance, you need to
- inspect the quality of UV exposed photoresist when doing photolithography,
- check for particles on wafers that have been processed in the furnaces or the PECVD's,
- check the quality of KOH etched structures or
- generally verify any in batch process
Using the different options such as bright/dark field, polarizer or transmitted/reflected light one can find a better signal for a specific need.
| Optical microscopes | SEM | AFM | |
|---|---|---|---|
| Magnification range | 25x to 1000x | 100x to 500.000x | Maximum scanned area 90x90 µm |
| Depth of focus | Low | Very high |