Specific Process Knowledge/Characterization/Sample imaging: Difference between revisions
No edit summary |
No edit summary |
||
Line 1: | Line 1: | ||
The list of instruments for sample imaging available at Danchip includes 6 [[Specific Process Knowledge/Characterization/Optical microscope|optical microscopes]] , three [[Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy|scanning electron microscopes]] (SEM's) and an [[Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy|atomic force microscope]] (AFM). These instruments cover a wide range of applications: Below is listed some characteristics. | The list of instruments for sample imaging available at Danchip includes 6 [[Specific Process Knowledge/Characterization/Optical microscope|optical microscopes]] , three [[Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy|scanning electron microscopes]] (SEM's) and an [[Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy|atomic force microscope]] (AFM). These instruments cover a wide range of applications: | ||
* The optical microscopes | |||
: Below is listed some characteristics. | |||
Revision as of 11:04, 24 January 2008
The list of instruments for sample imaging available at Danchip includes 6 optical microscopes , three scanning electron microscopes (SEM's) and an atomic force microscope (AFM). These instruments cover a wide range of applications:
- The optical microscopes
- Below is listed some characteristics.
Optical microscopes | SEM | AFM | |
---|---|---|---|
Magnification range | 25x to 1000x | 100x to 500.000x | Maximum scanned area 90x90 µm |
Depth of focus | Low | Very high |