Specific Process Knowledge/Characterization/Sample imaging: Difference between revisions

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The list of instruments for sample imaging available at Danchip includes a number of [[Specific Process Knowledge/Characterization/Optical microscope|optical microscopes]] , three [[Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy|scanning electron microscopes]] (SEM's) and an [[Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy|atomic force microscope]] (AFM).
The list of instruments for sample imaging available at Danchip includes 6 [[Specific Process Knowledge/Characterization/Optical microscope|optical microscopes]] , three [[Specific Process Knowledge/Characterization/SEM: Scanning Electron Microscopy|scanning electron microscopes]] (SEM's) and an [[Specific Process Knowledge/Characterization/AFM: Atomic Force Microscopy|atomic force microscope]] (AFM). These instruments cover a wide range of applications: Below is listed some characteristics.




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!SEM
!SEM
!AFM  
!AFM  
!Profiler
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| Magnification range
| Magnification range
|25x to 1000x
|100x to 500.000x
|Maximum scanned area 90x90 µm
|-
|Depth of focus
|A few microns
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|Depth of focus
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Revision as of 10:58, 24 January 2008

The list of instruments for sample imaging available at Danchip includes 6 optical microscopes , three scanning electron microscopes (SEM's) and an atomic force microscope (AFM). These instruments cover a wide range of applications: Below is listed some characteristics.



Optical microscopes SEM AFM
Magnification range 25x to 1000x 100x to 500.000x Maximum scanned area 90x90 µm
Depth of focus A few microns