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Specific Process Knowledge/Thin film deposition/Deposition of Silicon: Difference between revisions

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| This process is not running really stable nowadays.
| This process is not running really stable nowadays.


|}
== Sputtered Silicon in the Alcatel==
{| border="1" cellspacing="0" cellpadding="4"
|-style="background:silver; color:black"
!The parameter(s) changed 
!New value(s)
!Deposition rate
|-
|-style="background:WhiteSmoke; color:black"
|Standard parameters
|None
|
|-
|-style="background:LightGrey; color:black"
|Power
|400W
|3.8 Å/s
|-
|}
|}
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