Specific Process Knowledge/Lithography/Coaters: Difference between revisions

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 |style="background:LightGrey; color:black"|Coating thickness
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-* AZ5214E 1-4,2 µm
+Resist depended see spinning curves for differnt resist
-* E-beam resits 0,1-1 µm
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 !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameters
 |style="background:LightGrey; color:black"|Spin speed
 |style="background:WhiteSmoke; color:black" align="center" colspan="2"|
-*Cover closed: 7000 rpm
+Max. speed: 8000 rpm
-*Cover open: 1000 rpm
-* Gyrset: 3000 rpm
-* non-vaccum chuck: 5000 rpm
 |-
 |style="background:LightGrey; color:black"|Spin acceleration
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 |style="background:LightGrey; color:black"|Hotplate temperature
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-* 90° for III-V materials
+* changeable temperature from 20°-200° for III-V materials
-* 110° for III-V materials
 * changeable temperature from 20°-200° for other materials
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 All cleanroom materials.
-Please notice that III-V materials need to be run on the dedicated chuck!
 |-
 |style="background:LightGrey; color:black"|Batch