Specific Process Knowledge/Lithography/DUVStepperLithography: Difference between revisions
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We have observed that using automatic developing we can decrease the exposure dose for resolve the 250nm pillors structures comparing to dose needed for resolve the line the same size. | We have observed that using automatic developing we can decrease the exposure dose for resolve the 250nm pillors structures comparing to dose needed for resolve the line the same size. | ||
Here you can find a chart demonstrating a dependence between 250nm line width/pillors diameter and exposure dose. | Here you can find a chart demonstrating a dependence between 250nm line width/pillors diameter and exposure dose. | ||
[[Chart:Canon_Stepper_Reticle_Guide_v0_03.pdf]]. | |||