Specific Process Knowledge/Lithography/DUVStepperLithography: Difference between revisions
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'''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/DUVStepperLithography#Developer_TMAH_Stepper click here]''' | '''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography/DUVStepperLithography#Developer_TMAH_Stepper click here]''' | ||
This developer is dedicated for development of DUV resists. The developer is fully automatic and can run up to 25 substrates in a batch 4", 6", and 8" size. The machine is equipped with 1 developer line, in our case in 2, | This developer is dedicated for development of DUV resists. The developer is fully automatic and can run up to 25 substrates in a batch 4", 6", and 8" size. The machine is equipped with 1 developer line, in our case in 2,38% water based TMAH, 1 topside rinse line with water, 1 backside rinse line with water and 1 N2 line for drying. | ||
'''The user manual(s), quality control procedure(s) and results and contact information can be found in LabManager:''' | '''The user manual(s), quality control procedure(s) and results and contact information can be found in LabManager:''' | ||
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2, | 2,38% water based TMAH | ||
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!style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameters | !style="background:silver; color:black" align="center" valign="center" rowspan="3"|Process parameters | ||