Jump to content

Specific Process Knowledge/Lithography: Difference between revisions

Taran (talk | contribs)
Tigre (talk | contribs)
Line 5: Line 5:
'''Feedback to this page''': '''[mailto:photolith@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography click here]'''
'''Feedback to this page''': '''[mailto:photolith@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php?title=Specific_Process_Knowledge/Lithography click here]'''
<!-- Replace "http://labadviser.danchip.dtu.dk/..." with the link to the Labadviser page-->
<!-- Replace "http://labadviser.danchip.dtu.dk/..." with the link to the Labadviser page-->
=Mask Design=
In order to realize your device you will need a way to draw the patterns that define the structures in the different layers on the wafer.
This is done in a drawing tool for mask layout. The output is a file you send to a mask house, which in return supplies you with a number of photolithographic masks. Each mask is a glass plate with a chromium pattern that mimics a layer in your layout.
Please read more details here: [[/Mask Design|Mask Design]]


=Comparing lithography methods at DTU Danchip=
=Comparing lithography methods at DTU Danchip=