Specific Process Knowledge/Lithography/Coaters: Difference between revisions

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 '''Feedback to this section''': '''[mailto:labadviser@danchip.dtu.dk?Subject=Feed%20back%20from%20page%20http://labadviser.danchip.dtu.dk/index.php/Specific_Process_Knowledge/Lithography/Coaters#Spin_coater:_Manual_labspin click here]'''
-The Spin coater: Manual labspin is a SÜSS RCD8 Spin Coater intended for processing... of III-V compound semiconductors and CMOS compatible materals. Please note, that '''there are different chucks for III-V materials and Si-, SiO2-materials.''' The spinner is mounted in a flow hood located in the III-V laboratory (yellow room). The extra exhaust should always be turned on while spinning.
+The Spin coater: Manual Labspin is a SÜSS Labspin6 coater intended for processing of III-V compound semiconductors and CMOS compatible materals. The spinner is mounted in a flow hood located in the A-5 room(yellow room). The extra exhaust should always be turned on while spinning.
+Please note, that there are different spinnings bowls for differnet materials,so the first step before processing is choosing the proper bowl and mounting it in the spinner.
 '''The user manual, user APV, and contact information can be found in [http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=331 LabManager]'''