Specific Process Knowledge/Etch/Etching of Gold: Difference between revisions
| Line 34: | Line 34: | ||
Photoresist (1.5 µm AZ5214E) | Photoresist (1.5 µm AZ5214E) | ||
| | | | ||
Unmasked - used as a stripper | |||
|- | |- | ||
|Etch rate | |Etch rate | ||
| | | | ||
~100 nm/min | ~100 nm/min | ||
| | | | ||
~(??) nm/min | ~(??) nm/min | ||