Specific Process Knowledge/Thin film deposition/Deposition of Titanium Oxide: Difference between revisions
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==Deposition of Titanium Oxide== | ==Deposition of Titanium Oxide== | ||
Titanium oxide can be deposited only by sputter technique. At the moment the only system where we have a target for Titanium oxide is [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE/IBSD Ionfab300]]. The target is Ti. During the sputter deposition oxygen is added to the chamber resulting in Titanium oxide on the sample. | Titanium oxide can be deposited only by sputter technique. At the moment the only system where we have a target for Titanium oxide is [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE/IBSD Ionfab300]]. The target is Ti. During the sputter deposition oxygen is added to the chamber resulting in Titanium oxide on the sample. | ||
*[[/IBSD of TiO2|TiO2 made on IBE/IBSD Ionfab300]] | |||
==Comparison of the methods for deposition of Titanium Oxide== | ==Comparison of the methods for deposition of Titanium Oxide== | ||