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Specific Process Knowledge/Thin film deposition/Deposition of Titanium Oxide: Difference between revisions

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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,318 edits
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!
!
!Sputter technique using [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE/IBSD Ionfab300]]
!Sputter technique using [[Specific Process Knowledge/Etch/IBE⁄IBSD Ionfab 300|IBE/IBSD Ionfab300]]
![[Specific Process Knowledge/Thin film deposition/PECVD|Sputter System Lesker
![[Specific Process Knowledge/Thin film deposition/Lesker|Sputter System Lesker
]]
]]
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|-
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|-
|-style="background:LightGrey; color:black"
|-style="background:LightGrey; color:black"
!Parameter 1
!Stoichiometry
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|
*A
*A
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|-
|-style="background:WhiteSmoke; color:black"
|-style="background:WhiteSmoke; color:black"
!Parameter 2
!Film Thickness
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|
*A
*A
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*A
*A
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|-
|-style="background:LightGrey; color:black"
!Deposition rate
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*A
*B
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*A
*B
|-
|-
|-style="background:WhiteSmoke; color:black"
!Step coverage
|
*A
*B
*C
|
*A
|-
|-style="background:LightGrey; color:black"
!Process Temperature
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*A
*B
|
*A
*B
|-
|-
|-style="background:WhiteSmoke; color:black"
!More info on TiO2
|
*A
*B
*C
|
*A
|-




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