Specific Process Knowledge/Thermal Process/Oxidation: Difference between revisions
No edit summary |
No edit summary |
||
| Line 117: | Line 117: | ||
| | | | ||
*Dry: 5 SLM O<sub>2</sub> | *Dry: 5 SLM O<sub>2</sub> | ||
*Wet: | *Wet: Bubbler | ||
| | | | ||
*Dry: 5 SLM O<sub>2</sub> | *Dry: 5 SLM O<sub>2</sub> | ||
*Wet: | *Wet: Bubbler | ||
|- | |- | ||
|- | |- | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
! | !Annealing gas | ||
| | | | ||
* | *N<sub>2</sub> | ||
* | *Ar | ||
| | | | ||
* | *N<sub>2</sub> | ||
| | | | ||
*N<sub>2</sub> | |||
| | | | ||
*N<sub>2</sub> | |||
| | | | ||
*N<sub>2</sub> | |||
| | | | ||
*N<sub>2</sub> | |||
| | | | ||
*N<sub>2</sub> | |||
*Ar | |||
|- | |- | ||
| Line 142: | Line 147: | ||
|- | |- | ||
|-style="background:LightGrey; color:black" | |-style="background:LightGrey; color:black" | ||
!Substrate size | !Substrate and Batch size | ||
| | | | ||
*<nowiki>#</nowiki> | Up to 30 wafers | ||
*<nowiki>#</nowiki> 50 mm wafers | |||
*<nowiki>#</nowiki> 100 mm wafers | |||
| | |||
Up to 30 wafers | |||
*<nowiki>#</nowiki> 50 mm wafers | |||
*<nowiki>#</nowiki> 100 mm wafers | |||
| | |||
Up to 30 wafers | |||
*<nowiki>#</nowiki> 50 mm wafers | *<nowiki>#</nowiki> 50 mm wafers | ||
*<nowiki>#</nowiki> 100 mm wafers | *<nowiki>#</nowiki> 100 mm wafers | ||
| | | | ||
Up to 30 wafers | |||
*<nowiki>#</nowiki> 50 mm wafers | *<nowiki>#</nowiki> 50 mm wafers | ||
*<nowiki>#</nowiki> 100 mm wafers | *<nowiki>#</nowiki> 100 mm wafers | ||
*<nowiki>#</nowiki> 150 mm wafers | *<nowiki>#</nowiki> 150 mm wafers | ||
| | | | ||
Up to 30 wafers | |||
*<nowiki>#</nowiki> 50 mm wafers | |||
*<nowiki>#</nowiki> 100 mm wafers | |||
| | | | ||
Up to 150 wafers | |||
*<nowiki>#</nowiki> 100 mm wafers | |||
| | | | ||
Up to 20 wafers both vertical and horizontal | |||
*<nowiki>#</nowiki> Small samples | |||
*<nowiki>#</nowiki> 50 mm wafers | |||
*<nowiki>#</nowiki> 100 mm wafers | |||
|- | |- | ||