Specific Process Knowledge/Wafer cleaning: Difference between revisions
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As a general rule all wafers that go into the high temperature furnaces need a full RCA clean directly before the furnace step. | As a general rule all wafers that go into the high temperature furnaces need a full RCA clean directly before the furnace step. | ||
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'''Wafers that have been in the KOH baths, KOH BHF baths or the warm phosphoric acid''' <br/> | '''Wafers that have been in the KOH baths, KOH BHF baths or the warm phosphoric acid''' <br/> | ||