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Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,318 edits
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*
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|-style="background:WhiteSmoke; color:black"
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!4
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*~300nm - 4µm
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*~40nm - 30µm
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*Thin layers (up to 300-400 nm)
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*~10nm - ~1µm(>2h)
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|-style="background:LightGrey; color:black"
!Substrate size
!Substrate size
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|-style="background:LightGrey; color:black"
!'''Allowed materials'''
!'''Allowed materials'''
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