Specific Process Knowledge/Lithography/DUVStepperLithography: Difference between revisions
| Line 15: | Line 15: | ||
Information about resist can be found here: | Information about resist can be found here: | ||
* Bottom Anti Reflection Coating (BARC)[http://www.brewerscience.com/products/arc/dry-etch-arc-coatings/248nm-products/duv42s DUV 42S-6 ]. | * Bottom Anti Reflection Coating (BARC) [http://www.brewerscience.com/products/arc/dry-etch-arc-coatings/248nm-products/duv42s DUV 42S-6 ]. | ||
*[[Media:Datasheet_DUV42S.pdf |Datasheet DUV42S-6]]. | *[[Media:Datasheet_DUV42S.pdf |Datasheet DUV42S-6]]. | ||
*Positive DUV resist for spinning in 300-600nm thickness range [[Media:M230Y_PSM_annular_130C_PEB.pdf|KRF M230Y]]. | *Positive DUV resist for spinning in 300-600nm thickness range [[Media:M230Y_PSM_annular_130C_PEB.pdf|KRF M230Y]]. | ||