Specific Process Knowledge/Thin film deposition/Deposition of Aluminium: Difference between revisions
| Line 82: | Line 82: | ||
|-style="background:WhiteSmoke; color:black" | |-style="background:WhiteSmoke; color:black" | ||
! Comment | ! Comment | ||
| | |Thickness above 200 nm: ask for permission | ||
| | |Thickness above 200 nm: ask for permission | ||
|Only very thin layers (up to 100 nm). | |Only very thin layers (up to 100 nm). | ||
|Al sputter target: 99.995% Al | |Al sputter target: 99.995% Al | ||