Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions
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|80 <sup>o</sup>C | |80 <sup>o</sup>C | ||
|80 <sup>o</sup>C | |80 <sup>o</sup>C | ||
|~70 <sup>o</sup>C the chemicals will heat up to working temperature during mixing, '''therefore be careful!''' First ad H<sub>2</sub>SO<sub>4</sub> then H<sub>2</sub>O<sub>2</sub>{{fn|1}} | |~70 <sup>o</sup>C the chemicals will heat up to working temperature during mixing, '''therefore be careful!''' First ad H<sub>2</sub>SO<sub>4</sub> then H<sub>2</sub>O<sub>2</sub><sup>{{fn|1}}</sup> | ||
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{{fnb|1}} In preparing a solution involving an acid, always add the acid last. The exception to this rule is Piranha, in which case you add | {{fnb|1}} In preparing a solution involving an acid, always add the acid last. The exception to this rule is Piranha, in which case you add H<sub>2</sub>O<sub>2</sub>, which is a very strong base, to H<sub>2</sub>SO<sub>4</sub>, which is a very strong acid. This is done because it is potentially explosive and at the very least will cause the solution to become very warm. | ||