Specific Process Knowledge/Wafer cleaning/RCA: Difference between revisions
Appearance
No edit summary |
No edit summary |
||
| Line 22: | Line 22: | ||
*DI water rinsing (dumping three times) | *DI water rinsing (dumping three times) | ||
For procedure details please look in the [http://labmanager.danchip.dtu.dk/d4Show.php?id=1633&mach=243 user manual] in LabManager. | For procedure details please look in the [http://labmanager.danchip.dtu.dk/d4Show.php?id=1633&mach=243 user manual] in LabManager. | ||
'''The user manual, user APV and contact information can be found in LabManager:''' | |||
<!-- remember to remove the type of documents that are not present --> | |||
[http://labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=243 RCA info page in LabManager] | |||
==Overview of RCA process data== | ==Overview of RCA process data== | ||