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Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions

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{| border="2" cellspacing="0" cellpadding="4" align="left" width="570pt"
{| border="2" cellspacing="0" cellpadding="4" align="left" width="570pt"
|-style="background:silver; color:black"
!  
!  
! "7-up"
! "7-up"
! Piranha
! Piranha
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|-  
|-style="background:WhiteSmoke; color:black"
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|'''General description'''
|'''General description'''
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Cleaning of wafers using a beaker in the fumehood in cleanroom B1. Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the 7-up for wafers.
Cleaning of wafers using a beaker in the fumehood in cleanroom B1. Used for glass wafers or wafers with metal or other materials that you are not allowed to put in the 7-up for wafers.
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|-
|-style="background:LightGrey; color:black"
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|'''Chemical solution'''
|'''Chemical solution'''
|98% Sulfuric acid and Ammonium sulfate
|98% Sulfuric acid and Ammonium sulfate
|98% Sulfuric acid and Hydrogen peroxide 4:1 add H<sub>2</sub>O<sub>2</sub> to H<sub>2</sub>SO<sub>4</sub>
|98% Sulfuric acid and Hydrogen peroxide 4:1 add H<sub>2</sub>O<sub>2</sub> to H<sub>2</sub>SO<sub>4</sub>
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|-
|-style="background:WhiteSmoke; color:black"
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|'''Process temperature'''
|'''Process temperature'''
|80 <sup>o</sup>C
|80 <sup>o</sup>C
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|~70 <sup>o</sup>C the chemicals will heat up to working temperature during mixing, '''therefore be careful!'''First ad H2SO4 then H2O2
|~70 <sup>o</sup>C the chemicals will heat up to working temperature during mixing, '''therefore be careful!'''First ad H2SO4 then H2O2
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|-style="background:LightGrey; color:black"
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|'''Process time'''
|'''Process time'''
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10 min.
10 min.
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|-style="background:WhiteSmoke; color:black"
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|'''Allowed materials'''
|'''Allowed materials'''
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All materials (in beaker).
All materials (in beaker).
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|-style="background:LightGrey; color:black"
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|'''Batch size'''
|'''Batch size'''
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1-5 4" wafer at a time
1-5 4" wafer at a time
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|-style="background:WhiteSmoke; color:black"
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|'''Size of substrate'''
|'''Size of substrate'''
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|