Specific Process Knowledge/Wafer cleaning/7-up & Piranha: Difference between revisions
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[[Image:7-up_6inch.jpg|300x300px|right|thumb|7-up 6" in cleanroom D3. <br\> -Up to 25 wafers of 4" or 6" at a time.<br\> -Materials allowed: Silicon, Silicon oxide, Silicon nitride, PolySi]] | [[Image:7-up_6inch.jpg|300x300px|right|thumb|7-up 6" in cleanroom D3. <br\> -Up to 25 wafers of 4" or 6" at a time.<br\> -Materials allowed: Silicon, Silicon oxide, Silicon nitride, PolySi]] | ||
[[Image:7-up_Mask.jpg|300x300px|right|thumb|7-up for masks and glass wafers positioned in cleanroom | [[Image:7-up_Mask.jpg|300x300px|right|thumb|7-up for masks and glass wafers positioned in cleanroom D3:<br\> -Up to 25 glass wafers of 4" at a time or 4 masks.<br\> -Materials allowed: Silicon, Silicon oxide, Silicon nitride, PolySi, glass, chromium]] | ||
[[Image:7-up_RR3.jpg|300x300px|right|thumb|7-up 4": positioned in cleanroom | [[Image:7-up_RR3.jpg|300x300px|right|thumb|7-up 4": positioned in cleanroom C1<br\> -Up to 19 wafers of 4" at a time.<br\> -Materials allowed: Silicon, Silicon oxide, Silicon nitride, PolySi]] | ||
===Comparing data for "7-up" and Piranha=== | ===Comparing data for "7-up" and Piranha=== | ||