Specific Process Knowledge/Etch/Wet Platinum Etch: Difference between revisions
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*HCl : HNO<sub>3</sub> : H<sub>2</sub>O (7 : 1 : 8) at 85 °C | *HCl : HNO<sub>3</sub> : H<sub>2</sub>O (7 : 1 : 8) at 85 °C | ||
'''You have to be very | '''You have to be very careful when you work with this etch. It can generate nitrous oxides which are very toxic!!''' | ||
At this moment we do not have any information on the etch rate. You should be aware that this wet etch will also etch gold and it is not possible to use any masking material, it is used as a stripper. | At this moment we do not have any information on the etch rate. You should be aware that this wet etch will also etch gold and it is not possible to use any masking material, it is used as a stripper. | ||