Specific Process Knowledge/Etch/ICP Metal Etcher/silicon nitride: Difference between revisions
Created page with "===Slow etch of silicon nitride with resist as masking material - with direct clamping === This recipe can be used for slow etching of silicon nitride with resist as masking m..." |
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!Results | !Results | ||
!Test on wafer with 20% load | !Test on wafer with 20% load, by Izzet Yildiz @Nanotech | ||
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|Etch rate of LPCVD nitride | |Etch rate of LPCVD nitride | ||