Specific Process Knowledge/Etch/ICP Metal Etcher: Difference between revisions
| Line 24: | Line 24: | ||
*[[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon|Etch of silicon]] | *[[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon|Etch of silicon]] | ||
*[[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide|Etch of silicon oxide]] | *[[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide|Etch of silicon oxide]] | ||
*[[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon | *[[Specific Process Knowledge/Etch/ICP Metal Etcher/silicon nitride|Etch of silicon nitride]] | ||
==An overview of the performance of the ICP Metal Etcher and some process related parameters== | ==An overview of the performance of the ICP Metal Etcher and some process related parameters== | ||