Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions
Appearance
| Line 244: | Line 244: | ||
=Buffered HF-Clean= | =Buffered HF-Clean= | ||
[[Image:BHF_RR3.jpg|300x300px|thumb|BHF: positioned in | [[Image:BHF_RR3.jpg|300x300px|thumb|BHF: positioned in C-1]] | ||
Another commonly used method to render the surface of silicon wafers hydrophobic is the dilute HF dip. | Another commonly used method to render the surface of silicon wafers hydrophobic is the dilute HF dip. | ||