Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions
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|[[image:ICP_metal_slow_wafer_uniformity_s4075.jpg|275x275px|right|thumb|Contour plot of the etch rate over the wafer, 9 points measured]] | |[[image:ICP_metal_slow_wafer_uniformity_s4075.jpg|275x275px|right|thumb|Contour plot of the etch rate over the wafer, 9 points measured]] | ||
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| | |SEM profile images | ||
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<gallery caption="Some chemicals of the MVD and the surface reaction" widths="200px" heights="150px" perrow="3"> | |||
image:ICP_metal_resist_no_etch_s4075_2.jpg|Resist profile before etch | |||
image:ICP_metal_slow_s4075_sio2_4.jpg|Resist profiler after etch 01-02-2014. | |||
image:ICP_metal_slow_s4075_sio2_6.jpg|Resist profiler after etch 01-02-2014. No line width reduction observed. | |||
</gallery> | |||
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