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Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions

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DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
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Bghe (talk | contribs)
DCH-Employees-701, NLAB-Employees-701, NLAB-LabmanagerAllUsers, Bureaucrats, Administrators
7,301 edits
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|-
|-
|Selectivity to  resist [:1]
|Selectivity to  resist [:1]
|~0.9
|'''~0.9'''
|-
|-
|Wafer uniformity (100mm)
|Wafer uniformity (100mm)
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