Specific Process Knowledge/Etch/ICP Metal Etcher/silicon oxide: Difference between revisions
Created page with "===Slow etch of SiO2 with resist as masking material - with direct clamping 70px === This recipe can be used for slow etching of SiO2..." |
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|[[image: | |[[image:ICP_metal_slow_wafer_uniformity_s4075.jpg|275x275px|right|thumb|Contour plot of the etch rate over the wafer, 9 points measured]] | ||
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