Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions
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All surfaces can be divided to hydrophilic or hydrophobic surfaces, where the oxidized surfaces such SiO2 or surface with native oxide formation on Si or Al substrates consider to be hydrophilic and have very bad wetting with hydrophobic resist. | All surfaces can be divided to hydrophilic or hydrophobic surfaces, where the oxidized surfaces such SiO2 or surface with native oxide formation on Si or Al substrates consider to be hydrophilic and have very bad wetting with hydrophobic resist. | ||
Therefore it is very important to do the pretreatment step before the spinning. Here we will give an overview of | Therefore it is very important to do the pretreatment step before the spinning. Here we will give an overview of treatments available at Danchip to promote photoresist adhesion. | ||
=HMDS= | =HMDS= | ||