Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions
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!colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | !colspan="2" border="none" style="background:silver; color:black;" align="center"|Equipment | ||
|style="background:WhiteSmoke; color:black" align="center"|<b>HMDS oven</b> | |style="background:WhiteSmoke; color:black" align="center"|<b>HMDS oven</b> | ||
|style="background:WhiteSmoke; color:black" align="center"|<b>Spin Track 1 + 2</b> | |style="background:WhiteSmoke; color:black" align="center"|<b>[[Specific_Process_Knowledge/Lithography/Coaters#Spin Track 1 + 2|Spin Track 1 + 2]]</b> | ||
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!style="background:silver; color:black;" align="center" width="60"|Purpose | !style="background:silver; color:black;" align="center" width="60"|Purpose | ||