Specific Process Knowledge/Etch: Difference between revisions
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*[[/Wet Silicon Nitride Etch|Wet Silicon Nitride Etch]] | *[[/Wet Silicon Nitride Etch|Wet Silicon Nitride Etch]] | ||
*[[/Wet Silicon Oxide Etch (BHF)|Wet Silicon Oxide Etch (BHF)]] | *[[/Wet Silicon Oxide Etch (BHF)|Wet Silicon Oxide Etch (BHF)]]- ''writer:Louise'' | ||
*[[/KOH Etch|KOH Etch]] - ''Anisotropic silicon etch'' - ''writer:Flemming'' | *[[/KOH Etch|KOH Etch]] - ''Anisotropic silicon etch'' - ''writer:Flemming'' | ||
*[[/Wet Polysilicon Etch|Wet Polysilicon Etch]] - ''Isotropic silicon etch'' - ''writer:Flemming'' | *[[/Wet Polysilicon Etch|Wet Polysilicon Etch]] - ''Isotropic silicon etch'' - ''writer:Flemming'' | ||
*[[/Wet Aluminium Etch|Wet Aluminium Etch]] | *[[/Wet Aluminium Etch|Wet Aluminium Etch]] | ||