Specific Process Knowledge/Lithography/Pretreatment: Difference between revisions
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===Equipment performance and process related parameters=== | ===Equipment performance and process related parameters=== | ||
'''Overview of the main recipe:''' | '''Overview of the main recipe:''' | ||
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4. Backfill, return to atmosphere pressure ca. 3. min. | 4. Backfill, return to atmosphere pressure ca. 3. min. | ||
'''Overview of HMDS process:''' | '''Overview of HMDS process:''' | ||