Specific Process Knowledge/Thin film deposition/PECVD: Difference between revisions
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All though PECVD2 and 3 are very similar you should not expect to transfer a recipe between the systems and get the exact same result. | All though PECVD2 and 3 are very similar you should not expect to transfer a recipe between the systems and get the exact same result. | ||
== Recipes on PECVD1 | == Recipes on PECVD2, PECVD3 (and PECVD1:<span style="color:Red">Expired!</span>)== | ||
*Recipes for PECVD2 are in the III-V entry in LAbAdviser, see [[Specific Process Knowledge/III-V Process/thin film dep/pecvd2| here]] | *Recipes for PECVD2 are in the III-V entry in LAbAdviser, see [[Specific Process Knowledge/III-V Process/thin film dep/pecvd2| here]] | ||
*[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD#Recipes on PECVD3 for deposition of silicon oxides|Recipes on PECVD3 for deposition of silicon oxides]] | *[[Specific Process Knowledge/Thin film deposition/Deposition of Silicon Oxide/Deposition of Silicon Oxide using PECVD#Recipes on PECVD3 for deposition of silicon oxides|Recipes on PECVD3 for deposition of silicon oxides]] | ||