Specific Process Knowledge/Thin film deposition/Antistiction Coating: Difference between revisions
Created page with "== Processing on the MVD == The MVD coatings are created as self-assembled monolayers on a surface when a molecular vapor of chemials is present. These chemicals, typically..." |
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These chemicals, typically flourinated organosilanes, have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -Si<sub>(teflon)</sub>Cl<sub>x</sub>. As shown in the figure below, the chlorine atoms react with Si<sub>(surface)</sub>-OH groups of the surface to form a chemical bond -Si(<sub>(teflon)</sub>)-O-Si<sub>(surface)</sub>- under elimination of HCL. This means that both Si and SiO<sub>2</sub> surfaces are coated because of the native oxide on Si surfaces. | These chemicals, typically flourinated organosilanes, have a teflon-like tail consisting of -(CF<sub>2</sub>)<sub>x</sub>CF<sub>3</sub> and, in the other end, a reactive group -Si<sub>(teflon)</sub>Cl<sub>x</sub>. As shown in the figure below, the chlorine atoms react with Si<sub>(surface)</sub>-OH groups of the surface to form a chemical bond -Si(<sub>(teflon)</sub>)-O-Si<sub>(surface)</sub>- under elimination of HCL. This means that both Si and SiO<sub>2</sub> surfaces are coated because of the native oxide on Si surfaces. | ||
<gallery caption="Some chemicals | <gallery caption="Some chemicals used in MVD and the Si surface reaction" widths="200px" heights="150px" perrow="2"> | ||
image:chlorosilanes.jpg|Different chemicals for the MVD. | image:chlorosilanes.jpg|Different chemicals for the MVD. | ||
image:MVDsurfacereaction.jpg|The chemical reaction in which the Cl atoms of the precursors are eliminated under formation of HCl. | image:MVDsurfacereaction.jpg|The chemical reaction in which the Cl atoms of the precursors are eliminated under formation of HCl. | ||