Specific Process Knowledge/Etch/KOH Etch: Difference between revisions

Revision as of 14:41, 14 January 2008 view source BGE (talk \| contribs) Bureaucrats, danchip, Administrators 2,908 edits No edit summary ← Older edit		Revision as of 14:42, 14 January 2008 view source BGE (talk \| contribs) Bureaucrats, danchip, Administrators 2,908 edits No edit summary Newer edit →
Line 1:		Line 1:
	==KOH etch - ''Anisotropic silicon etch''==		==KOH etch - ''Anisotropic silicon etch''==
			[[Image:KOH_4tommer.jpg\|300x399px\|thumb\|KOH etch for 4" wafers: positioned in cleanroom 3]]

Revision as of 14:42, 14 January 2008