Jump to content

Specific Process Knowledge/Characterization/Sample imaging: Difference between revisions

From LabAdviser
← Older editNewer edit →
VisualWikitext
No edit summary
Jml (talk | contribs)
Bureaucrats, danchip, Administrators
1,918 edits
No edit summary
Line 1: Line 1:
The list of instruments for sample imaging available at Danchip includes a number of optical microscopes, an AFM and three SEM's.
The list of instruments for sample imaging available at Danchip includes a number of optical microscopes, three scanning electron microscopes (SEM) and a atomic force microscopy.


In one end is the very basic photograph of a sample or wafer that may be taken with the digital camera using the great macro functionality (Ask a Danchip employee to borrow it). In the other is the very advanced [[Specific Process Knowledge/Characterization/SEM:_Scanning_Electron_Microscopy/FEI|FEI SEM]] that is capable of taking high magnification images of any sample or wafer.




Line 11: Line 10:
!Profiler  
!Profiler  
|-  
|-  
| Magnification
| Magnification range
|
|
|
|

Revision as of 16:41, 21 January 2008

The list of instruments for sample imaging available at Danchip includes a number of optical microscopes, three scanning electron microscopes (SEM) and a atomic force microscopy.


Optical microscopes SEM AFM Profiler
Magnification range
Depth of focus
Retrieved from "https://labadviser.nanolab.dtu.dk//index.php?title=Specific_Process_Knowledge/Characterization/Sample_imaging&oldid=1446"