Specific Process Knowledge/Thermal Process/Jipelec RTP: Difference between revisions
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[[Image:RTP_oven.jpg|300x300px|thumb|Jipelec RTP: Positioned in cleanroom 1]] | [[Image:RTP_oven.jpg|300x300px|thumb|Jipelec RTP: Positioned in cleanroom 1]] | ||
The Jipelec is a rapid thermal processing oven. It | The Jipelec is a rapid thermal processing (RTP) oven. It is be used for fast and well-controlled annealing or alloying of samples. It is possible to use either a thermocouple or a pyrometer to control the temperature (of the sample carrier). | ||
'''The user manual | '''The user manual, technical information and contact information can be found in LabManager:''' | ||
'''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=164 Jipelec RTP]''' | '''[http://www.labmanager.danchip.dtu.dk/function.php?module=Machine&view=view&mach=164 Jipelec RTP]''' | ||
Revision as of 11:58, 15 January 2014
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Jipelec - Rapid Thermal Processing

The Jipelec is a rapid thermal processing (RTP) oven. It is be used for fast and well-controlled annealing or alloying of samples. It is possible to use either a thermocouple or a pyrometer to control the temperature (of the sample carrier).
The user manual, technical information and contact information can be found in LabManager:
| Purpose | RTP annealing | |
|---|---|---|
| Process parameter range | Process Temperature |
|
| Process pressure |
| |
| Gasses on the system |
| |
| Substrates | Batch size |
|
| Substrate material allowed |
A silicon carrier wafer with 1 µm oxide is always need (except for III-V materials)
|