Specific Process Knowledge/Thermal Process/C4 Aluminium Anneal furnace: Difference between revisions
| Line 45: | Line 45: | ||
*1-30 100 mm wafers (or 50 mm wafers) | *1-30 100 mm wafers (or 50 mm wafers) | ||
|- | |- | ||
| style="background:LightGrey; color:black"|Substrate | | style="background:LightGrey; color:black"|Substrate materials allowed | ||
|style="background:WhiteSmoke; color:black"| | |style="background:WhiteSmoke; color:black"| | ||
*Silicon wafers with alluminium. | *Silicon wafers with alluminium. | ||