Specific Process Knowledge/Thermal Process/A3 Phosphor Drive-in furnace: Difference between revisions
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==Phosphorus Drive-in furnace (A3)== | ==Phosphorus Drive-in furnace (A3)== | ||
[[Image:A3helstak.jpg|thumb|300x300px|Phosphorus Drive-in furnace (A3). Positioned in cleanroom | [[Image:A3helstak.jpg|thumb|300x300px|Phosphorus Drive-in furnace (A3). Positioned in cleanroom B-1]] | ||
The Phosphorus Drive-in furnace (A3) is a Tempress horizontal furnace for oxidation of silicon wafers, annealing of the grown oxide and for drive-in of phosphorus after a pre-deposition. Phosphorus pre-deposition takes place in the Phosphorus Pre-dep furnace (A4). The Phosphorus Drive-in furnace can also be used for drive-in of phosphorus which has been ion implanted. | The Phosphorus Drive-in furnace (A3) is a Tempress horizontal furnace for oxidation of silicon wafers, annealing of the grown oxide and for drive-in of phosphorus after a pre-deposition. Phosphorus pre-deposition takes place in the Phosphorus Pre-dep furnace (A4). The Phosphorus Drive-in furnace can also be used for drive-in of phosphorus which has been ion implanted. | ||
The Phosphorus Drive-in furnace is the third furnace tube in the A-stack positioned in cleanroom | The Phosphorus Drive-in furnace is the third furnace tube in the A-stack positioned in cleanroom B-1. The furnaces in the A-stack are the cleanest of all furnaces in the cleanroom. Please be aware of that all wafers have to be RCA cleaned before they enter the furnace, and check the cross contamination information in LabManager before you use the furnace. | ||
'''The user manual, quality control instruction and results, technical information and contact information can be found in LabManager:''' | '''The user manual, quality control instruction and results, technical information and contact information can be found in LabManager:''' | ||